Thin Film Deposition PVD Coating Magnetron Sputtering System

Thin Film Deposition PVD Coating Magnetron Sputtering System

Slender CZPT Deposition PVD Coating CZPTron Sputtering Method

[PVD] 
Bodily Vapor Deposition: Vacuum deposition techniques which can be utilised to deposit skinny films and coatings.

Description 
Multi-arc Ion Sputtering Coating CZPT is substantial performing and easy running, equipped with arc sputtering technique.
Substrate Content: Glass, Metal, Ceramics Glass, Metal (carbon steel, stainless steel, brass), Ceramics, CZPT, jewellery.
Advocate CZPT: Multi Arc CZPTron Sputtering Plating CZPT
Structure Kind:  Vertical framework, #304 CZPT Steel
A. Coating CZPT: Multi-functional metallic film, composite movie, transparent conductive movie,  reflectance-rising film, electromagnetic shielding movie, decorative movie
B. CZPT Colour: gold, rose gold, silver, vibrant, sapphire blue, gun black, brown, dark black, and so on
C. CZPT kind: TiN, CrN, ZrN, TiCN, TiCrN, TiNC, TiALN and DLC
D. Consumables in manufacturing: CZPT, Chromium, Zirconium

Procedure

Software
A. Look at market, these kinds of as watch belt, watchcase, dial and so on.
B. CZPT, this sort of as sanitary ware, door deal with, doorway locks
C. CZPT market, this sort of as stainless steel plate, stair handrail, columns
D. Telephone shell, elements
E. CZPT, eyeglasses frame
F. CZPT, such as glass cup, glass lamps, glass artworks
G. Desk wares, like steel forks and knives.
H. Golfing wares, like golf head, golfing pole and golfing balls.
 I. CZPT CZPT/toilet wares
J. Massive dimension sheet, plate, pipe, tube and so on. Like huge stainless metal plate and furnitures.

Advantages 
A. Pumps: 
CZPT pump + roots pump + diffusion pump + holding pump (or optional: cryogenic pump, cryogenic pump technique)
B. Gasoline System: one-4 path
C. Minimal Vacuum: six*ten-4 pa (cleanroom, no-loading)
D. Targets: arc 6-18sets, magnetron focus on one-2sets
E. Electrical power Sources: DC energy offer, Medium frequency electrical power offer, medium frequency energy source, heater supply, activation electricity supply, pulsed bias voltage electricity provide
F. Targets: DC CZPTic Goal, Medium Twin Goal, Aircraft Focus on
H. Gasoline Time : 5*10-4 pa, within 30mins
I. Controlled by Handbook, Semi-computerized, Complete computerized, PLC

 
Workshop 

For more details on configurations quotations, remember to get in touch with us.
HangZhou Danko Vacuum CZPT Co.,Ltd
https://
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Thin Film Deposition PVD Coating Magnetron Sputtering System