PVD Mf Magnetron Sputtering Vacuum Plating Coating Machine

PVD Mf Magnetron Sputtering Vacuum Plating Coating Machine

PVD Mf CZPTron Sputtering Vacuum Plating Coating CZPT

Bodily Vapor Deposition: Vacuum deposition strategies which can be utilized to deposit slim films and coatings.

Multi-arc Ion Sputtering Coating CZPT is substantial performing and straightforward working, geared up with arc sputtering system.
Substrate Content: Glass, Metallic, Ceramics Glass, Metal (carbon steel, stainless metal, brass), Ceramics, CZPT, jewelry.
Suggest CZPT: Multi Arc CZPTron Sputtering Plating CZPT
Composition Type:  Vertical structure, #304 CZPT Steel
A. Coating CZPT: Multi-practical metallic film, composite movie, clear conductive film,  reflectance-growing movie, electromagnetic shielding movie, ornamental movie
B. CZPT Colour: gold, rose gold, silver, colorful, sapphire blue, gun black, brown, dark black, and so on
C. CZPT kind: TiN, CrN, ZrN, TiCN, TiCrN, TiNC, TiALN and DLC
D. Consumables in production: CZPT, Chromium, Zirconium


A. View industry, this sort of as look at belt, watchcase, dial and so forth.
B. CZPT, such as sanitary ware, door deal with, door locks
C. CZPT industry, this kind of as stainless metal plate, stair handrail, columns
D. Mobile phone shell, elements
E. CZPT, eyeglasses body
F. CZPT, these kinds of as glass cup, glass lamps, glass artworks
G. Desk wares, like metal forks and knives.
H. Golfing wares, like golf head, golfing pole and golf balls.
 I. CZPT CZPT/bathroom wares
J. Huge dimensions sheet, plate, pipe, tube and so on. Like large stainless steel plate and furnitures.

A. Pumps: 
CZPT pump + roots pump + diffusion pump + holding pump (or optional: cryogenic pump, cryogenic pump technique)
B. Gas Program: 1-4 route
C. Restricted Vacuum: six*ten-4 pa (cleanroom, no-loading)
D. Targets: arc 6-18sets, magnetron concentrate on 1-2sets
E. Electrical power Resources: DC electrical power supply, Medium frequency power provide, medium frequency power supply, heater offer, activation electricity source, pulsed bias voltage electrical power source
F. Targets: DC CZPTic Target, Medium Twin Concentrate on, Airplane Goal
H. Fuel Time : 5*10-4 pa, in 30mins
I. Managed by Manual, Semi-automated, Full automatic, PLC


For much more particulars on configurations quotations, remember to make contact with us.
HangZhou Danko Vacuum CZPT Co.,Ltd

PVD Mf Magnetron Sputtering Vacuum Plating Coating Machine